Measurements from a novel interferometer for EUVL mirror substrates

A previously reported interferometer without intermediate optics is used to perform measurements on an aspherical extreme ultraviolet lithography mirror substrate. Acousto-optic modulation based phase shifting is used together with a novel phase retrieval algorithm to retrieve the phase distribution from our interferograms. The phase...

Inverse propagation algorithm for angstrom accuracy interferometer

This paper will illustrate several approaches to retrieving the shape of aspherical reflective surfaces as used in EUV Lithography, from measurements from a previously reported angstrom-accuracy interferometer. First, the working principles of the interferometer will be reviewed, and typical measurement data expected from the instrument will be...