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Meskers, A.J.H. (author)Lithographic exposure equipment for integrated circuit manufacturing requires ever more accurate position measurement systems, which is currently led by the advent of Extreme UltraViolet (EUV)-lithography machines. This PhD-research describes an interferometric displacement measurement system that possess the potential to foresee in the need for...doctoral thesis 2014
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Soloviev, O. (author), Vdovin, G. (author)This article presents a prototype of a CMOS phase sensor for high accuracy (1 Angstrom) heterodyne interferometry. Switched integrators realization of a lock-in pixel for 4-bucket phase detection algorithm is described and illustrated by experimental results. Factors that limit the accuracy of this implementation and possible ways for its...conference paper 2005