On the improvement of heterodyne displacement interferometry: Enhancing measurement linearity and system modularity

Lithographic exposure equipment for integrated circuit manufacturing requires ever more accurate position measurement systems, which is currently led by the advent of Extreme UltraViolet (EUV)-lithography machines. This PhD-research describes an interferometric displacement measurement system that possess the potential to foresee in the need for...

CMOS integrator based lock-in pixel for heterodyne interferometry

This article presents a prototype of a CMOS phase sensor for high accuracy (1 Angstrom) heterodyne interferometry. Switched integrators realization of a lock-in pixel for 4-bucket phase detection algorithm is described and illustrated by experimental results. Factors that limit the accuracy of this implementation and possible ways for its...