Correction of the phase retardation caused by intrinsic birefringence in deep UV lithography

In the year 2001 it was reported that the birefringence induced by spatial dispersion (BISD), sometimes also called intrinsic birefringence, had been measured and calculated for fluorides CaF2 and BaF2 in the deep UV range. It was also shown that the magnitude of the BISD in these cubic crystals is sufficiently large to cause serious problems...

Networks of local minima for EUV mirror systems

Poster presentation Optics Research Group TU Delft in cooperation with ASM Lithograpy and TNO

Generation of optical systems for lithography via saddle points

Poster presentation Optics Research Group TU Delft in cooperation with ASM Lithograpy and TNO

Avoiding unstable regions in the design space of EUV mirror systems comprising high-order aspheric surfaces

When Extreme Ultraviolet mirror systems having several high-order aspheric surfaces are optimized, the configurations often enter into highly unstable regions of the parameter space. Small changes of system parameters lead then to large changes in ray paths, and therefore optimization algorithms crash because certain sssumptions upon which they...

The effect of intrinsic birefringence in deep UV-lithography

The subject of birefringence induced by spatial dispersion (BISD), also called intrinsic birefringence, recently became an important issue for 157-nm lithography. For the deep UV range, because of intrinsic absorption, only crystalline materials can be used as optical materials for lens manufacturing. The physical properties of crystals are...

Networks of local minima for EUV mirror systems

Poster presentation Optics Research Group TU Delft in cooperation with ASM Lithograpy

Avoiding unstable regions in the design space of EUV mirror systems with high-order aspheric surfaces

Poster presentation Optics Research Group TU Delft in cooperation with ASM Lithograpy