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Hagen, C.W. (author), Kruit, P. (author)The authors have analyzed how much current can be obtained in the probe of an optimized two-lens focused ion beam (FIB) system. This becomes relevant, as systems become available that have the potential to image and/or fabricate structures smaller than 10 nm. The probe current versus probe size curves were calculated for a commercial gallium-FIB...journal article 2009
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Bronsgeest, M.S. (author), Kruit, P. (author)The Schottky electron source is predominant in today’s focused electron-beam equipment, but its properties are still not fully understood. Generally, its performance is predicted, assuming its tip end geometry is known and stable. In this work, it is shown that the size of the end facet (slowly) shrinks upon reduction in the extraction voltage...journal article 2009
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Dokania, A.K. (author), Kruit, P. (author)The Schottky electron emitter is the most frequently used electron source in electron microscopes. A suppressor electrode around the emitter is usually employed to prevent emission from the shank of the cathode. A concept of operating the Schottky emitter without the suppressor electrode is proposed with the aim of lowering the potential of the...journal article 2009
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Van Bruggen, M.J. (author), Van Someren, B. (author), Kruit, P. (author)Micro-Einzel lenses always suffer from chromatic and spherical aberration, even when the electron beam is exactly on the optical axis of the lens. When the inclination of the electron beam with respect to the lens axis increases, additional effects such as coma, astigmatism, and defocus start to dominate. An example of inclined electron beams in...journal article 2009
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Kruit, P. (author), Van Overbeek, F. (author), Gravendeel, B. (author)The invention relates to a railway infrastructure for a tram- or train transport system, comprising rails and an overhead contact line for providing the tram or train movable over the rails with an electrical drive power, which overhead contact line comprises overhead contact line sections connected to each other, each of which are individually...patent 2009
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Kruit, P. (author), Van Overbeeke, F. (author), Gravendeel, B. (author)Abstract of corresponding document: EP 2017118 (A1) The invention relates to a railway infrastructure for a tram- or train transport system, comprising rails and an overhead contact line for providing the tram or train movable over the rails with an electrical drive power, which overhead contact line comprises overhead contact line sections...patent 2009
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Dokania, A.K. (author), Hendrikx, R. (author), Kruit, P. (author)The electron sources in electron microscopes and electron lithography machines often consist of small diameter W(100) wires, etched to form a sharp tip. The electron emission is facilitated by the Schottky effect, thus the name Schottky emitter. The authors are investigating the feasibility of arrays of such electron emitters for the use in...journal article 2009
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Hagen, C.W. (author), Fokkema, E. (author), Kruit, P. (author)The virtual source size of a liquid metal ion source is an order of magnitude larger than the size of the region from which the ions are emitted at the source. This source size has a direct effect on the reduced brightness and, hence, on the performance of these sources. The variation of the virtual source size of a gallium liquid metal ion...journal article 2008
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Castaldo, V. (author), Hagen, C.W. (author), Rieger, B. (author), Kruit, P. (author)In principle, a scanning ion microscope can produce smaller probe sizes than a scanning electron microscope because the diffraction contribution is smaller. However, the imaging resolution is often severely limited by the sputtering damage. In this article, an experimental procedure to establish the limit of a focused ion beam system for imaging...journal article 2008
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Bronsgeest, M.S. (author), Kruit, P. (author)The stability of the physical shape of an electron emitter (co)determines the stability of the performance of electron-beam equipment. A typical short-term instability of the Schottky electron source is the instability of the (100) facet at the tip end known as “collapsing rings.” This instability causes probe instabilities, but it is known from...journal article 2008
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- Kruit, P. (author), Van Dorp, W.F. (author), Hagen, C.W. (author), Crozier, P.A. (author) journal article 2008
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Slot, E. (author), Wieland, M.J. (author), de Boer, G. (author), Kruit, P. (author), Ten Berge, G.F. (author), Houkes, A.M.C. (author), Jager, R. (author), Van de Peut, T. (author), Peijster, J.J.M. (author), Steenbrink, S.W.H.K. (author)MAPPER Lithography is developing a maskless lithography technology. The technology combines massively-parallel electron-beam writing with high speed optical data transport used in the telecommunication industry. The electron optics generates 13,000 electron beams that are focused on the wafer by electrostatic lens arrays which are manufactured...conference paper 2008
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Bronsgeest, M.S. (author), Barth, J.E. (author), Swanson, L.W. (author), Kruit, P. (author)Probe size, shape, and current are important parameters for the performance of all probe forming systems such as the scanning (transmission) electron microscope, the focused ion beam microscope, and the Gaussian electron beam lithography system. Currently, however, the relation between probe current and probe size is ill defined. The key lies in...journal article 2008
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Zhang, Y. (author), Barth, J.E. (author), Kruit, P. (author)For multielectron beam systems with a single electron source, the outside beams need to be collimated before entering the individual microcolumns. As an alternative of the traditional multibeam source design where the broad beam from the source is collimated by a single lens, the broad beam can be first split in subbeams that are focused by a...journal article 2008
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Dokania, A.K. (author), Kruit, P. (author)This paper reports the preliminary feasibility study of room temperature vulcanization (RTV) 566 for its application as a “spring” for in situ height adjustment in our proposed design for an array of Schottky emitters. The reliability of the RTV 566 is tested in terms of its viscoelastic properties for thicknesses of 95, 142, and 195 ?m. The...journal article 2008
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Van Someren, B. (author), Kruit, P. (author)The invention relates to a method for forming an image of a beam source that during operation provides a beam, and wherein the beam is split so as to divide the beam into beamlets, wherein a redirecting organ is used with which each individual beamlet is redirected to a predetermined degree with the extent of redirection of each beamlet by means...patent 2008
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- Van Dorp, W.F. (author), Hagen, C.W. (author), Crozier, P.A. (author), Kruit, P. (author) journal article 2008
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Kruit, P. (author), Ferreira, J.A. (author)The invention relates to compensation device for a magnetic field generated through electric traction in a tram or train transport system that comprises an overhead line and rails, the overhead line and rails during operation being live, wherein a predetermined section of the overhead line and rails is provided with adjacent circuits, each of...patent 2007
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Kruit, P. (author)The invention relates to a scanning transmission electron microscope comprising an electron source, an electron accelerator and deflection means for directing electrons emitted by the electron source at an object to be examined, and in addition a detector for detecting electrons coming from the object and, connected to the detector, a device for...patent 2006
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- Kruit, P. (author), Van Bruggen, M.J. (author) patent 2006