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Thomas, S. (author), Kohstall, C. (author), Kruit, P. (author), Hommelhoff, P. (author)We discuss the effect of semitransparency in a quantum-Zeno-like interaction-free measurement setup, a quantum-physics based approach that might significantly reduce sample damage in imaging and microscopy. With an emphasis on applications in electron microscopy, we simulate the behavior of probe particles in an interaction-free measurement...journal article 2014
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Verduin, T. (author), Kruit, P. (author), Hagen, C.W. (author)We investigated the off-line metrology for line edge roughness (LER) determination by using the discrete power spectral density (PSD). The study specifically addresses low-dose scanning electron microscopy (SEM) images in order to reduce the acquisition time and the risk of resist shrinkage. The first attempts are based on optimized elliptic...journal article 2014
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Hari, S. (author), Hagen, C.W. (author), Verduin, T. (author), Kruit, P. (author)In a first study to analyze the feasibility of electron beam-induced deposition (EBID) for creating certain patterns in advanced lithography, line patterns were fabricated on silicon wafers using EBID. The growth conditions were such that the growth rate is fully determined by the electron flux (the current limited growth regime). It is...journal article 2014
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Narvaez, A.C. (author), Weppelman, I.G.C. (author), Moerland, R.J. (author), Liv, N. (author), Zonnevylle, A.C. (author), Kruit, P. (author), Hoogenboom, J.P. (author)Cathodoluminescence (CL) microscopy is an emerging analysis technique in the fields of biology and photonics, where it is used for the characterization of nanometer sized structures. For these applications, the use of transparent substrates might be highly preferred, but the detection of CL from nanostructures on glass is challenging because of...journal article 2013
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Kruit, K.D. (author), Vervloet, D. (author), Kapteijn, F. (author), Van Ommen, J.R. (author)Non-ASF product distributions in Fischer–Tropsch synthesis can occur with a gradient in process conditions at the particle or reactor scale, leading to a gradient in chain growth probability a.Weighted summation of local product distributions gives the proper, non-ASF product distribution.journal article 2013
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Liv, N. (author), Zonnevylle, A.C. (author), Narvaez, A.C. (author), Effting, A.P.J. (author), Voorneveld, P.W. (author), Lucas, M.S. (author), Hardwick, J.C. (author), Wepf, R.A. (author), Kruit, P. (author), Hoogenboom, J.P. (author)Correlative light and electron microscopy (CLEM) is a unique method for investigating biological structure-function relations. With CLEM protein distributions visualized in fluorescence can be mapped onto the cellular ultrastructure measured with electron microscopy. Widespread application of correlative microscopy is hampered by elaborate...journal article 2013
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Verduin, T. (author), Cook, B. (author), Kruit, P. (author)The authors investigate by simulation the Coulomb effects on brightness and energy spread for cold field emitters. At first, we show that brightness is ultimately limited by Coulomb interactions. The authors analyze the maximum attainable brightness for tip radii ranging from 1?nm to 1??m. Remarkably, the brightness of a tip of 1?nm is...journal article 2011
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Jun, D.S. (author), Kutchoukov, V.G. (author), Kruit, P. (author)A next generation ion source suitable for both high resolution focused ion beam milling and imaging applications is currently being developed. The new ion source relies on a method of which positively charged ions are extracted from a miniaturized gas chamber where neutral gas atoms become ionized by direct electron impact. The use of a very...journal article 2011
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Post, P.C. (author), Mohammadi-Gheidari, A. (author), Hagen, C.W. (author), Kruit, P. (author)Lithography techniques based on electron-beam-induced processes are inherently slow compared to light lithography techniques. The authors demonstrate here that the throughput can be enhanced by a factor of 196 by using a scanning electron microscope equipped with a multibeam electron source. Using electron-beam induced deposition with MeCpPtMe3...journal article 2011
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Van Oven, J.C. (author), Berwald, F. (author), Berggren, K.K. (author), Kruit, P. (author), Hagen, C.W. (author)This paper demonstrates electron-beam-induced deposition of few-nm-width dense features on bulk samples by using a scanning electron-beam lithography system. To optimize the resultant features, three steps were taken: (1) features were exposed in a repetitive sequence, so as to build up the deposited features gradually across the entire pattern,...journal article 2011
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Castaldo, V. (author), Withagen, J. (author), Hagen, C. (author), Kruit, P. (author), Van Veldhoven, E. (author)In recent years, novel ion sources have been designed and developed that have enabled focused ion beam machines to go beyond their use as nano-fabrication tools. Secondary electrons are usually taken to form images, for their yield is high and strongly dependent on the surface characteristics, in terms of chemical composition and topography. In...journal article 2011
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Cook, B.J. (author), Verduin, T. (author), Hagen, C.W. (author), Kruit, P. (author)Emission theory predicts that high brightness cold field emitters can enhance imaging in the electron microscope. This (neglecting chromatic aberration) is because of the large (coherent) probe current available from a high brightness source and is based on theoretically determined values of reduced brightnesses up to 1014?A/(m2?sr?V). However,...journal article 2010
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Mohammadi-Gheidari, A. (author), Hagen, C.W. (author), Kruit, P. (author)The authors present the first results obtained with their multibeam scanning electron microscope. For the first time, they were able to image 196 (array of 14×14) focused beams of a multielectron beam source on a specimen using single beam scanning electron microscope (SEM) optics. The system consists of an FEI Novanano 200 SEM optics column...journal article 2010
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Castaldo, V. (author), Hagen, C.W. (author), Kruit, P. (author), Van Veldhoven, E. (author), Maas, D. (author)The determination of the quality of an imaging system is not an easy task for, in general, at least three parameters, strictly interdependent, concur in defining it: resolution, contrast, and signal-to-noise ratio. The definition of resolution itself in scanning microscopy is elusive and the case of scanning ion microscopy is complicated by the...journal article 2009
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Zonnevylle, A.C. (author), Hagen, C.W. (author), Kruit, P. (author), Valenti, M. (author), Schmidt-Ott, A. (author)Positioning of charged nanoparticles with the help of charge patterns in an insulator substrate is a known method. However, the creation of charge patterns with a scanning electron microscope for this is relatively new. Here a scanning electron microscope is used for the creation of localized charge patterns in an insulator, while a glowing wire...journal article 2009
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Hagen, C.W. (author), Kruit, P. (author)The authors have analyzed how much current can be obtained in the probe of an optimized two-lens focused ion beam (FIB) system. This becomes relevant, as systems become available that have the potential to image and/or fabricate structures smaller than 10 nm. The probe current versus probe size curves were calculated for a commercial gallium-FIB...journal article 2009
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Bronsgeest, M.S. (author), Kruit, P. (author)The Schottky electron source is predominant in today’s focused electron-beam equipment, but its properties are still not fully understood. Generally, its performance is predicted, assuming its tip end geometry is known and stable. In this work, it is shown that the size of the end facet (slowly) shrinks upon reduction in the extraction voltage...journal article 2009
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Dokania, A.K. (author), Kruit, P. (author)The Schottky electron emitter is the most frequently used electron source in electron microscopes. A suppressor electrode around the emitter is usually employed to prevent emission from the shank of the cathode. A concept of operating the Schottky emitter without the suppressor electrode is proposed with the aim of lowering the potential of the...journal article 2009
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Van Bruggen, M.J. (author), Van Someren, B. (author), Kruit, P. (author)Micro-Einzel lenses always suffer from chromatic and spherical aberration, even when the electron beam is exactly on the optical axis of the lens. When the inclination of the electron beam with respect to the lens axis increases, additional effects such as coma, astigmatism, and defocus start to dominate. An example of inclined electron beams in...journal article 2009
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Dokania, A.K. (author), Hendrikx, R. (author), Kruit, P. (author)The electron sources in electron microscopes and electron lithography machines often consist of small diameter W(100) wires, etched to form a sharp tip. The electron emission is facilitated by the Schottky effect, thus the name Schottky emitter. The authors are investigating the feasibility of arrays of such electron emitters for the use in...journal article 2009
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