Demonstration of spot size reduction by focussing amplitude modulated radially polarized light on a photoresist

Spot size reduction is demonstrated by printing focused spots from amplitude-modulated radially polarized light at the wavelength ? = 405 nm on a photoresist. Amplitude modulation is realized by ring illumination and by application of an optimized amplitude distribution function. Amplitude modulation is implemented via spatial light modulator,...

Size and shape control of sub-20 nm patterns fabricated using focused electron beam-induced processing

In a first study to analyze the feasibility of electron beam-induced deposition (EBID) for creating certain patterns in advanced lithography, line patterns were fabricated on silicon wafers using EBID. The growth conditions were such that the growth rate is fully determined by the electron flux (the current limited growth regime). It is...

Saddle-point construction in the design of lithographic objectives, part 1: Method

Saddle-point construction in the design of lithographic objectives, part 2: Application

Network search method in the design of extreme ultraviolet lithographic objectives

The merit function space of mirror system for extreme ultraviolet (EUV) lithography is studied. Local minima situated in the multidimensional optical merit function space are connected via links that contain saddle points and form a network. We present networks for EUV lithographic objective designs and discuss how these networks change when...