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- Verduin, T. (author), Lokhorst, S.R. (author), Kruit, P. (author), Hagen, C.W. (author) conference paper 2015
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Slot, E. (author), Wieland, M.J. (author), de Boer, G. (author), Kruit, P. (author), Ten Berge, G.F. (author), Houkes, A.M.C. (author), Jager, R. (author), Van de Peut, T. (author), Peijster, J.J.M. (author), Steenbrink, S.W.H.K. (author)MAPPER Lithography is developing a maskless lithography technology. The technology combines massively-parallel electron-beam writing with high speed optical data transport used in the telecommunication industry. The electron optics generates 13,000 electron beams that are focused on the wafer by electrostatic lens arrays which are manufactured...conference paper 2008
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Castaldo, V. (author), Withagen, J. (author), Hagen, C. (author), Kruit, P. (author), Van Veldhoven, E. (author)In recent years, novel ion sources have been designed and developed that have enabled focused ion beam machines to go beyond their use as nano-fabrication tools. Secondary electrons are usually taken to form images, for their yield is high and strongly dependent on the surface characteristics, in terms of chemical composition and topography. In...journal article 2011
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Cook, B.J. (author), Verduin, T. (author), Hagen, C.W. (author), Kruit, P. (author)Emission theory predicts that high brightness cold field emitters can enhance imaging in the electron microscope. This (neglecting chromatic aberration) is because of the large (coherent) probe current available from a high brightness source and is based on theoretically determined values of reduced brightnesses up to 1014?A/(m2?sr?V). However,...journal article 2010
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Liv, N. (author), Zonnevylle, A.C. (author), Narvaez, A.C. (author), Effting, A.P.J. (author), Voorneveld, P.W. (author), Lucas, M.S. (author), Hardwick, J.C. (author), Wepf, R.A. (author), Kruit, P. (author), Hoogenboom, J.P. (author)Correlative light and electron microscopy (CLEM) is a unique method for investigating biological structure-function relations. With CLEM protein distributions visualized in fluorescence can be mapped onto the cellular ultrastructure measured with electron microscopy. Widespread application of correlative microscopy is hampered by elaborate...journal article 2013
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Hagen, C.W. (author), Fokkema, E. (author), Kruit, P. (author)The virtual source size of a liquid metal ion source is an order of magnitude larger than the size of the region from which the ions are emitted at the source. This source size has a direct effect on the reduced brightness and, hence, on the performance of these sources. The variation of the virtual source size of a gallium liquid metal ion...journal article 2008
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Kruit, P. (author), Bezuijen, M. (author), Barth, J.E. (author)The potential application of carbon nanotubes as electron sources in electron microscopes is analyzed. The resolution and probe current that can be obtained from a carbon nanotube emitter in a low-voltage scanning electron microscope are calculated and compared to the state of the art using Schottky electron sources. Many analytical equations...journal article 2006
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Van Bruggen, M.J. (author), Van Someren, B. (author), Kruit, P. (author)Micro-Einzel lenses always suffer from chromatic and spherical aberration, even when the electron beam is exactly on the optical axis of the lens. When the inclination of the electron beam with respect to the lens axis increases, additional effects such as coma, astigmatism, and defocus start to dominate. An example of inclined electron beams in...journal article 2009
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Dokania, A.K. (author), Kruit, P. (author)This paper reports the preliminary feasibility study of room temperature vulcanization (RTV) 566 for its application as a “spring” for in situ height adjustment in our proposed design for an array of Schottky emitters. The reliability of the RTV 566 is tested in terms of its viscoelastic properties for thicknesses of 95, 142, and 195 ?m. The...journal article 2008
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Dokania, A.K. (author), Kruit, P. (author)The Schottky electron emitter is the most frequently used electron source in electron microscopes. A suppressor electrode around the emitter is usually employed to prevent emission from the shank of the cathode. A concept of operating the Schottky emitter without the suppressor electrode is proposed with the aim of lowering the potential of the...journal article 2009
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Castaldo, V. (author), Hagen, C.W. (author), Kruit, P. (author), Van Veldhoven, E. (author), Maas, D. (author)The determination of the quality of an imaging system is not an easy task for, in general, at least three parameters, strictly interdependent, concur in defining it: resolution, contrast, and signal-to-noise ratio. The definition of resolution itself in scanning microscopy is elusive and the case of scanning ion microscopy is complicated by the...journal article 2009
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Hari, S. (author), Hagen, C.W. (author), Verduin, T. (author), Kruit, P. (author)In a first study to analyze the feasibility of electron beam-induced deposition (EBID) for creating certain patterns in advanced lithography, line patterns were fabricated on silicon wafers using EBID. The growth conditions were such that the growth rate is fully determined by the electron flux (the current limited growth regime). It is...journal article 2014
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Hagen, C.W. (author), Kruit, P. (author)The authors have analyzed how much current can be obtained in the probe of an optimized two-lens focused ion beam (FIB) system. This becomes relevant, as systems become available that have the potential to image and/or fabricate structures smaller than 10 nm. The probe current versus probe size curves were calculated for a commercial gallium-FIB...journal article 2009
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Verduin, T. (author), Cook, B. (author), Kruit, P. (author)The authors investigate by simulation the Coulomb effects on brightness and energy spread for cold field emitters. At first, we show that brightness is ultimately limited by Coulomb interactions. The authors analyze the maximum attainable brightness for tip radii ranging from 1?nm to 1??m. Remarkably, the brightness of a tip of 1?nm is...journal article 2011
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Zonnevylle, A.C. (author), Hagen, C.W. (author), Kruit, P. (author), Valenti, M. (author), Schmidt-Ott, A. (author)Positioning of charged nanoparticles with the help of charge patterns in an insulator substrate is a known method. However, the creation of charge patterns with a scanning electron microscope for this is relatively new. Here a scanning electron microscope is used for the creation of localized charge patterns in an insulator, while a glowing wire...journal article 2009
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Dokania, A.K. (author), Hendrikx, R. (author), Kruit, P. (author)The electron sources in electron microscopes and electron lithography machines often consist of small diameter W(100) wires, etched to form a sharp tip. The electron emission is facilitated by the Schottky effect, thus the name Schottky emitter. The authors are investigating the feasibility of arrays of such electron emitters for the use in...journal article 2009
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Post, P.C. (author), Mohammadi-Gheidari, A. (author), Hagen, C.W. (author), Kruit, P. (author)Lithography techniques based on electron-beam-induced processes are inherently slow compared to light lithography techniques. The authors demonstrate here that the throughput can be enhanced by a factor of 196 by using a scanning electron microscope equipped with a multibeam electron source. Using electron-beam induced deposition with MeCpPtMe3...journal article 2011
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Narvaez, A.C. (author), Weppelman, I.G.C. (author), Moerland, R.J. (author), Liv, N. (author), Zonnevylle, A.C. (author), Kruit, P. (author), Hoogenboom, J.P. (author)Cathodoluminescence (CL) microscopy is an emerging analysis technique in the fields of biology and photonics, where it is used for the characterization of nanometer sized structures. For these applications, the use of transparent substrates might be highly preferred, but the detection of CL from nanostructures on glass is challenging because of...journal article 2013
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Castaldo, V. (author), Hagen, C.W. (author), Rieger, B. (author), Kruit, P. (author)In principle, a scanning ion microscope can produce smaller probe sizes than a scanning electron microscope because the diffraction contribution is smaller. However, the imaging resolution is often severely limited by the sputtering damage. In this article, an experimental procedure to establish the limit of a focused ion beam system for imaging...journal article 2008
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- Kruit, P. (author), Van Dorp, W.F. (author), Hagen, C.W. (author), Crozier, P.A. (author) journal article 2008