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Continuous production of nanostructured particles using spatial atomic

Van Ommen, J.R. (author), Kooijman, D. (author), De Niet, M. (author), Talebi, M. (author), Goulas, A. (author)

In this paper, the authors demonstrate a novel spatial atomic layer deposition (ALD) process based on pneumatic transport of nanoparticle agglomerates. Nanoclusters of platinum (Pt) of ?1?nm diameter are deposited onto titania (TiO2) P25 nanoparticles resulting to a continuous production of an active photocatalyst (0.12–0.31?wt. % of Pt) at a...

journal article 2015

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Residue-free plasma etching of polyimide coatings for small pitch vias with improved step coverage

Mimoun, B.A.Z. (author), Pham, H.T.M. (author), Henneken, V. (author), Dekker, R. (author)

The authors have found that patterning polyimide coatings containing organosilane adhesion promoter using pure oxygen plasma resulted in a thin silicon-rich residue layer. They show in this paper that adding small amounts of fluorine-containing gas to the etching gas mixture is necessary in order to achieve residue-free polyimide plasma etching....

journal article 2013

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Characterization of low temperature deposited atomic layer deposition TiO2 for MEMS applications

Huang, Y. (author), Pandraud, G. (author), Sarro, P.M. (author)

TiO2 is an interesting and promising material for micro-/nanoelectromechanical systems (MEMS/NEMS). For high performance and reliable MEMS/NEMS, optimization of the optical characteristics, mechanical stress, and especially surface smoothness of TiO2 is required. To overcome the roughness issue of the TiO2 films due to crystallization during...

journal article 2012

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Substrate temperature and electron fluence effects on metallic films created by electron beam induced deposition

Rosenberg, S.G. (author), Landheer, K. (author), Hagen, C.W. (author), Fairbrother, D.H. (author)

Using three different precursors [MeCpPtMe3, Pt(PF3)4, and W(CO)6], an ultra-high vacuum surface science approach has been used to identify and rationalize the effects of substrate temperature and electron fluence on the chemical composition and bonding in films created by electron beam induced deposition (EBID). X-ray photoelectron spectroscopy...

journal article 2012

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Quantification of the atomic hydrogen flux as a function of filament temperature and H2 flow rate

Ugur, D. (author), Storm, A.J. (author), Verberk, R. (author), Brouwer, J.C. (author), Sloof, W.G. (author)

An isothermal sensor is developed to quantify the atomic hydrogen flux on a surface, which can be located at any distance from the molecular hydrogen cracking unit. This flux is determined from the measured heat effect due to recombination of atomic hydrogen at the sensor surface. The temperature of the sensor was kept constant at 350°C to keep...

journal article 2012

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Influence of gun design on Coulomb interactions in a field emission gun

Verduin, T. (author), Cook, B. (author), Kruit, P. (author)

The authors investigate by simulation the Coulomb effects on brightness and energy spread for cold field emitters. At first, we show that brightness is ultimately limited by Coulomb interactions. The authors analyze the maximum attainable brightness for tip radii ranging from 1?nm to 1??m. Remarkably, the brightness of a tip of 1?nm is...

journal article 2011

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Ion beams in SEM: An experiment towards a high brightness low energy spread electron impact gas ion source

Jun, D.S. (author), Kutchoukov, V.G. (author), Kruit, P. (author)

A next generation ion source suitable for both high resolution focused ion beam milling and imaging applications is currently being developed. The new ion source relies on a method of which positively charged ions are extracted from a miniaturized gas chamber where neutral gas atoms become ionized by direct electron impact. The use of a very...

journal article 2011

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Pulsed helium ion beam induced deposition: A means to high growth rates

Alkemade, P.F.A. (author), Miro, H. (author), Van Veldhoven, E. (author), Maas, D.J. (author), Smith, D.A. (author), Rack, P.D. (author)

The sub-nanometer beam of a helium ion microscope was used to study and optimize helium-ion beam induced deposition of PtC nanopillars with the (CH3)3Pt(CPCH3) precursor. The beam current, beam dwell time, precursor refresh time, and beam focus have been independently varied. Continuous beam exposure resulted in narrow but short pillars, while...

journal article 2011

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Parallel electron-beam-induced deposition using a multi-beam scanning electron microscope

Post, P.C. (author), Mohammadi-Gheidari, A. (author), Hagen, C.W. (author), Kruit, P. (author)

Lithography techniques based on electron-beam-induced processes are inherently slow compared to light lithography techniques. The authors demonstrate here that the throughput can be enhanced by a factor of 196 by using a scanning electron microscope equipped with a multibeam electron source. Using electron-beam induced deposition with MeCpPtMe3...

journal article 2011

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In situ study of hydrogen silsesquioxane dissolution rate in salty and electrochemical developers

Harry, K.J. (author), Strobel, S.. (author), Yang, J.K.W. (author), Duan, H. (author), Berggren, K.K. (author)

In order to better characterize the development of the electron-beam resist hydrogen silsesquioxane (HSQ), the authors used a quartz crystal microbalance (QCM) to study its rate of dissolution in situ. The authors determined the effect of both salt concentration and applied electric potential on the development rate of HSQ. The development rates...

journal article 2011

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Electron-beam-induced deposition of 3-nm-half-pitch patterns on bulk Si

Van Oven, J.C. (author), Berwald, F. (author), Berggren, K.K. (author), Kruit, P. (author), Hagen, C.W. (author)

This paper demonstrates electron-beam-induced deposition of few-nm-width dense features on bulk samples by using a scanning electron-beam lithography system. To optimize the resultant features, three steps were taken: (1) features were exposed in a repetitive sequence, so as to build up the deposited features gradually across the entire pattern,...

journal article 2011

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Brightness limitations of cold field emitters caused by Coulomb interactions

Cook, B.J. (author), Verduin, T. (author), Hagen, C.W. (author), Kruit, P. (author)

Emission theory predicts that high brightness cold field emitters can enhance imaging in the electron microscope. This (neglecting chromatic aberration) is because of the large (coherent) probe current available from a high brightness source and is based on theoretically determined values of reduced brightnesses up to 1014?A/(m2?sr?V). However,...

journal article 2010

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Model for nanopillar growth by focused helium ion-beam-induced deposition

Alkemade, P.F.A. (author), Chen, P. (author), Van Veldhoven, E. (author), Maas, D. (author)

An analytical model for the growth of nanopillars by helium ion-beam-induced deposition is presented and compared to experimental data. This model describes the competition between pillar growth in vertical and lateral directions. It assumes that vertical growth is induced by incident primary ions and type-1 secondary electrons, whereas lateral...

journal article 2010

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Multibeam scanning electron microscope: Experimental results

Mohammadi-Gheidari, A. (author), Hagen, C.W. (author), Kruit, P. (author)

The authors present the first results obtained with their multibeam scanning electron microscope. For the first time, they were able to image 196 (array of 14×14) focused beams of a multielectron beam source on a specimen using single beam scanning electron microscope (SEM) optics. The system consists of an FEI Novanano 200 SEM optics column...

journal article 2010

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Atomic radical abatement of organic impurities from electron beam deposited metallic structures

Wnuk, J.D. (author), Gorham, J.M. (author), Rosenberg, S.G. (author), Madey, T.E. (author), Hagen, C.W. (author), Fairbrother, D.H. (author)

Focused electron beam induced processing (FEBIP) of volatile organometallic precursors has become an effective and versatile method of fabricating metal-containing nanostructures. However, the electron stimulated decomposition process responsible for the growth of these nanostructures traps much of the organic content from the precursor’s ligand...

journal article 2010

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On the influence of the sputtering in determining the resolution of a scanning ion microscope

Castaldo, V. (author), Hagen, C.W. (author), Kruit, P. (author), Van Veldhoven, E. (author), Maas, D. (author)

The determination of the quality of an imaging system is not an easy task for, in general, at least three parameters, strictly interdependent, concur in defining it: resolution, contrast, and signal-to-noise ratio. The definition of resolution itself in scanning microscopy is elusive and the case of scanning ion microscopy is complicated by the...

journal article 2009

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Positioning Pd catalyst particles for carbon nanotube growth using charge patterns created with a scanning electron microscope

Zonnevylle, A.C. (author), Hagen, C.W. (author), Kruit, P. (author), Valenti, M. (author), Schmidt-Ott, A. (author)

Positioning of charged nanoparticles with the help of charge patterns in an insulator substrate is a known method. However, the creation of charge patterns with a scanning electron microscope for this is relatively new. Here a scanning electron microscope is used for the creation of localized charge patterns in an insulator, while a glowing wire...

journal article 2009

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Roles of secondary electrons and sputtered atoms in ion-beam-induced deposition

Chen, P. (author), Salemink, H.W.M. (author), Alkemade, P.F.A. (author)

The authors report the results of investigating two models for ion-beam-induced deposition (IBID). These models describe IBID in terms of the impact of secondary electrons and of sputtered atoms, respectively. The yields of deposition, sputtering, and secondary electron emission, as well as the energy spectra of the secondary electrons were...

journal article 2009

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Optimization of focused ion beam performance

Hagen, C.W. (author), Kruit, P. (author)

The authors have analyzed how much current can be obtained in the probe of an optimized two-lens focused ion beam (FIB) system. This becomes relevant, as systems become available that have the potential to image and/or fabricate structures smaller than 10 nm. The probe current versus probe size curves were calculated for a commercial gallium-FIB...

journal article 2009

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Beam induced deposition of platinum using a helium ion microscope

Sanford, C.A. (author), Stern, L. (author), Barriss, L. (author), Farkas, L. (author), DiManna, M. (author), Mello, R. (author), Maas, D.J. (author), Alkemade, P.F.A. (author)

Helium ion microscopy is now a demonstrated practical technology that possesses the resolution and beam currents necessary to perform nanofabrication tasks, such as circuit edit applications. Due to helium’s electrical properties and sample interaction characteristics relative to gallium, it is likely that the properties and deposition...

journal article 2009