Chaotic behavior in an algorithm to escape from poor local minima in lens design

In lens design, damped least-squares methods are typically used to find the nearest local minimum to a starting configuration in the merit function landscape. In this paper, we explore the use of such a method for a purpose that goes beyond local optimization. The merit function barrier, which separates an unsatisfactory solution from a...

Instabilities and fractal basins of attraction in optical system optimization

Many optical design programs use various forms of the damped least-squares method for local optimization. In this paper, we show that damped least-squares algorithms, with maximized computational speed, can create sensitivity with respect to changes in initial conditions. In such cases, starting points, which are very close to each other, lead...

High-resolution microspectrometer with an aberration-correcting planar grating

A concept for a highly miniaturized spectrometer featuring a two-component design is presented. The first component is a planar chip that integrates an input slit and aberration-correcting diffraction grating with an image sensor and is fabricated using microelectromechanical systems (MEMS) technologies. Due to the fabrication in a simple MEMS...

Optimal implementation of a microspectrometer based on a single flat diffraction grating

An analytical model has been developed and applied to explore the limits in the design of a highly miniaturized planar optical microspectrometer based on an imaging diffraction grating. This design tool has been validated as providing the smallest possible dimensions while maintaining acceptable spectral resolution. The resulting planar...

Network search method in the design of extreme ultraviolet lithographic objectives

The merit function space of mirror system for extreme ultraviolet (EUV) lithography is studied. Local minima situated in the multidimensional optical merit function space are connected via links that contain saddle points and form a network. We present networks for EUV lithographic objective designs and discuss how these networks change when...