Searched for: subject%3A%22electronics%22
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Hesam Mahmoudi Nezhad, N. (author), Ghaffarian Niasar, M. (author), Hagen, C.W. (author), Kruit, P. (author)
To design electron lens systems, applying a fully automated optimization routine has not yet been feasible, especially for the case where the optimization has many free variables of the lens system, such as all parameters that define the geometry of the lens electrodes and the voltage of each electrode. Hence, the study of the implementation of...
conference paper 2023
document
Krielaart, M.A.R. (author), Kruit, P. (author)
We have analyzed the possibilities of wave front shaping with miniature patterned electron mirrors through the WKB approximation. Based on this, we propose a microscopy scheme that uses two miniature electron mirrors on an auxiliary optical axis that is in parallel with the microscope axis. A design for this microscopy scheme is presented for...
journal article 2022
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Hari, S. (author), Trompenaars, P. H.F. (author), Mulders, J. J.L. (author), Kruit, P. (author), Hagen, C.W. (author)
High resolution dense lines patterned by focused electron beam-induced deposition (FEBID) have been demonstrated to be promising for lithography. One of the challenges is the presence of interconnecting material, which is often carbonaceous, between the lines as a result of the Gaussian line profile. We demonstrate the use of focused electron...
journal article 2021
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Abedzadeh, Navid (author), Krielaart, M.A.R. (author), Kim, Chung Soo (author), Simonaitis, John (author), Hobbs, Richard (author), Kruit, P. (author), Berggren, Karl K. (author)
The use of electron mirrors in aberration correction and surface-sensitive microscopy techniques such as low-energy electron microscopy has been established. However, in this work, by implementing an easy to construct, fully electrostatic electron mirror system under a sample in a conventional scanning electron microscope (SEM), we present a...
journal article 2021
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Krielaart, M.A.R. (author), Kruit, P. (author)
Electron beams can be reflected by an electrode that is at a more negative potential than the cathode from which the beam is emitted. We want to design a mirror with a flat mirror electrode where the electrons are reflected at a plane very close to the electrode. The wave front of an electron can then be shaped when the mirror contains a...
journal article 2021
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Hesam Mahmoudi Nezhad, N. (author), Ghaffarian Niasar, M. (author), Hagen, C.W. (author), Kruit, P. (author)
In electron optics, the design of electron lens systems is still a challenge. To optimize such systems, the objective function which should be calculated, depends on the electric potential distribution in the space created by the lenses. To obtain the electric potential, the existing methods are generally based on some mathematical techniques...
conference paper 2020
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Zhang, L. (author), Garming, M.W.H. (author), Hoogenboom, J.P. (author), Kruit, P. (author)
Electrostatic beam blankers are an alternative to photo-emission sources for generating pulsed electron beams for Time-resolved Cathodoluminescence and Ultrafast Electron Microscopy. While the properties of beam blankers have been extensively investigated in the past for applications in lithography, characteristics such as the influence of...
journal article 2020
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van Kessel, L.C.P.M. (author), Hagen, C.W. (author), Kruit, P. (author)
Background: Monte Carlo simulations of scanning electron microscopy (SEM) images ignore most surface effects, such as surface plasmons. Previous experiments have shown that surface plasmons play an important role in the emission of secondary electrons (SEs).Aim: We investigate the influence of incorporating surface plasmons into simulations...
journal article 2019
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Stopka, J. (author), Kruit, P. (author)
Statistical Coulomb interactions in conventional scanning electron microscopy mostly affect the probe size via energy spread and virtual source broadening in the emitter vicinity. However, in a multi-beam probe forming system such as a multi-beam scanning electron microscopes (MBSEM), the trajectory displacement due to interactions in the...
journal article 2019
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van Kessel, L.C.P.M. (author), Hagen, C.W. (author), Kruit, P. (author)
We have investigated the contributions of surface effects to Monte Carlo simulations of top-down scanning electron microscopy (SEM) images. The elastic and inelastic scattering mechanisms in typical simulations assume that the electron is deep in the bulk of the material. In this work, we correct the inelastic model for surface effects. We...
conference paper 2019
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Hari, S. (author), Verduin, T. (author), Kruit, P. (author), Hagen, C.W. (author)
The potential of Electron Beam Induced Deposition (EBID) to become a reliable and reproducible direct-write nanopatterning technique has been investigated. A key requirement is that patterns of sub-20 nm dimension can be reproducibly fabricated and measured. EBID was used for the controlled fabrication of sub-20 nm dense lines on bulk silicon...
journal article 2019
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Weppelman, I.G.C. (author), Moerland, R.J. (author), Hoogenboom, J.P. (author), Kruit, P. (author)
We present a new method to create ultrashort electron pulses by integrating a photoconductive switch with an electrostatic deflector. This paper discusses the feasibility of such a system by analytical and numerical calculations. We argue that ultrafast electron pulses can be achieved for micrometer scale dimensions of the blanker, which are...
journal article 2018
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Ren, Y. (author), Kruit, P. (author)
Our group is developing a multibeam scanning electron microscope (SEM) with 196 beams in order to increase the throughput of SEM. Three imaging systems using, respectively, transmission electron detection, secondary electron detection, and backscatter electron detection are designed in order to make it as versatile as a single beam SEM. This...
journal article 2016
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Verduin, T. (author), Lokhorst, S.R. (author), Hagen, C.W. (author), Kruit, P. (author)
In the simulation of secondary electron yields (SEY) and secondary electron microscopy (SEM) images, there is always the question: are we using the correct scattering cross-sections?. The three scattering processes of interest are quasi-elastic phonon scattering, elastic Mott scattering and inelastic scattering using the dielectric function...
journal article 2016
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Verduin, T. (author), Kruit, P. (author), Hagen, C.W. (author)
We investigated the off-line metrology for line edge roughness (LER) determination by using the discrete power spectral density (PSD). The study specifically addresses low-dose scanning electron microscopy (SEM) images in order to reduce the acquisition time and the risk of resist shrinkage. The first attempts are based on optimized elliptic...
journal article 2014
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Hari, S. (author), Hagen, C.W. (author), Verduin, T. (author), Kruit, P. (author)
In a first study to analyze the feasibility of electron beam-induced deposition (EBID) for creating certain patterns in advanced lithography, line patterns were fabricated on silicon wafers using EBID. The growth conditions were such that the growth rate is fully determined by the electron flux (the current limited growth regime). It is...
journal article 2014
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Verduin, T. (author), Cook, B. (author), Kruit, P. (author)
The authors investigate by simulation the Coulomb effects on brightness and energy spread for cold field emitters. At first, we show that brightness is ultimately limited by Coulomb interactions. The authors analyze the maximum attainable brightness for tip radii ranging from 1?nm to 1??m. Remarkably, the brightness of a tip of 1?nm is...
journal article 2011
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Jun, D.S. (author), Kutchoukov, V.G. (author), Kruit, P. (author)
A next generation ion source suitable for both high resolution focused ion beam milling and imaging applications is currently being developed. The new ion source relies on a method of which positively charged ions are extracted from a miniaturized gas chamber where neutral gas atoms become ionized by direct electron impact. The use of a very...
journal article 2011
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Post, P.C. (author), Mohammadi-Gheidari, A. (author), Hagen, C.W. (author), Kruit, P. (author)
Lithography techniques based on electron-beam-induced processes are inherently slow compared to light lithography techniques. The authors demonstrate here that the throughput can be enhanced by a factor of 196 by using a scanning electron microscope equipped with a multibeam electron source. Using electron-beam induced deposition with MeCpPtMe3...
journal article 2011
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Van Oven, J.C. (author), Berwald, F. (author), Berggren, K.K. (author), Kruit, P. (author), Hagen, C.W. (author)
This paper demonstrates electron-beam-induced deposition of few-nm-width dense features on bulk samples by using a scanning electron-beam lithography system. To optimize the resultant features, three steps were taken: (1) features were exposed in a repetitive sequence, so as to build up the deposited features gradually across the entire pattern,...
journal article 2011
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