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Jun, D.S. (author), Kutchoukov, V.G. (author), Kruit, P. (author)A next generation ion source suitable for both high resolution focused ion beam milling and imaging applications is currently being developed. The new ion source relies on a method of which positively charged ions are extracted from a miniaturized gas chamber where neutral gas atoms become ionized by direct electron impact. The use of a very...journal article 2011