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Kluba, M.M. (author), Arslan, A. (author), Stoute, R. (author), Muganda, James (author), Dekker, R. (author)This paper presents a new method for the CMOS compatible fabrication of microchannels integrated into a silicon substrate. In a single-step DRIE process (Deep Reactive Ion Etching) a network of microchannels with High Aspect Ratio (HAR) up to 10, can be etched in a silicon substrate through a mesh mask. In the same single etching step,...conference paper 2017
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- Liefrink, F. (author), Scholten, A.J. (author), Dekker, C. (author), Dijkhuis, J.I. (author), Eppenga, R. (author), Van Houten, H. (author), Foxon, C.T. (author) conference paper 1992