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Verduin, T. (author), Lokhorst, S.R. (author), Hagen, C.W. (author), Kruit, P. (author)In the simulation of secondary electron yields (SEY) and secondary electron microscopy (SEM) images, there is always the question: are we using the correct scattering cross-sections?. The three scattering processes of interest are quasi-elastic phonon scattering, elastic Mott scattering and inelastic scattering using the dielectric function...journal article 2016
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Verduin, T. (author), Lokhorst, S.R. (author), Hagen, C.W. (author), Kruit, P. (author)We have developed a fast three dimensional Monte-Carlo framework for the investigation of shotnoise induced side-wall roughness (SWR) formation. The calculation outline is demonstrated by an example for an exposure of a 100nm thick layer of negative tone resist (NTR) resist on top of an infinitely thick silicon substrate. We use our home...conference paper 2016