Locality mapping captures the displacement imposed by a mirroring surface in anamorphic art. Establishing this mapping for a physical mirror, however, is a difficult task. Applying pattern matching on the distorted reflection is a promising technique, though existing pattern matching strategies are often ill equipped for this particular task. This paper proposes a novel pattern- and pattern matching strategy designed to provide robustness against the artifacts introduced by mirror anamorphosis. The resulting approach, though computationally intense, is able to provide an arbitrary quantity of anchor points given the necessary image quality.