Research Update: Reactively sputtered nanometer-thin ZrN film as a diffusion barrier between Al and boron layers for radiation detector applications
Journal Article
(2014)
Author(s)
N Golshani (TU Delft - Electronic Components, Technology and Materials)
Vahid Mohammadi (TU Delft - Electronic Components, Technology and Materials)
H. Schellevis (TU Delft - Electronic Components, Technology and Materials)
Kees Beenakker (TU Delft - Electrical Engineering, Mathematics and Computer Science)
Ryoichi Ishihara (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
DOI related publication
https://doi.org/10.1063/1.4897959
To reference this document use:
https://resolver.tudelft.nl/uuid:05bea22a-d3db-4569-87a3-7ddf4e2f8694
More Info
expand_more
expand_more
Publication Year
2014
Language
English
Research Group
Electronic Components, Technology and Materials
Issue number
10 - 100702
Volume number
2
Pages (from-to)
1-9
No files available
Metadata only record. There are no files for this record.