The etching of silicon carbide in inductively coupled SF6/O-2 plasma
Journal Article
(2003)
Author(s)
NOV Plank (External organisation)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
R Cheung (External organisation)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:111308c8-bd33-46a5-bd84-96dbef6082e4
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Publication Year
2003
Research Group
QN/Kavli Nanolab Delft
Issue number
5
Volume number
36
Pages (from-to)
482-487
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