Cl-2/O-2-inductively coupled plasma etching of deep hole-type photonic crystals in InP
Journal Article
(2006)
Author(s)
CF Carlstrom (External organisation)
R van der Heijden (External organisation)
F Karouta (External organisation)
RW van der Heijden (External organisation)
Huub Salemink (TU Delft - QN/Photronic Devices)
Emile van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Research Group
QN/Photronic Devices
To reference this document use:
https://resolver.tudelft.nl/uuid:12ac2614-f70a-4be7-9d2f-1a6b6abdeb42
More Info
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Publication Year
2006
Research Group
QN/Photronic Devices
Issue number
1
Volume number
24
Pages (from-to)
6-9
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