Cl-2/O-2-inductively coupled plasma etching of deep hole-type photonic crystals in InP

Journal article (2006)

Authors

CF Carlstrom External organisation
R van der Heijden External organisation
F Karouta External organisation
RW van der Heijden External organisation
H.W.M. Salemink QN/Photronic Devices
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
Research Group
QN/Photronic Devices
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Published Date

2006

Language

Undefined/Unknown

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Research Group

QN/Photronic Devices