Chemical vapor deposition of alpha-boron layers on silicon for controlled nanometer deep p+n junction formation

Sarubbi, F; Scholtes, T.L.M.; Nanver, L.K.

Chemical vapor deposition of alpha-boron layers on silicon for controlled nanometer deep p+n junction formation

Journal article (2009)

Authors

F Sarubbi Electronic Components, Technology and Materials -

T.L.M. Scholtes Electronic Components, Technology and Materials -

L.K. Nanver Electronic Components, Technology and Materials -

Research Group

Electronic Components, Technology and Materials () (TU Delft)

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Published Date

2009

Language

English

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials