Chemical vapor deposition of alpha-boron layers on silicon for controlled nanometer deep p+n junction formation
Journal Article
(2009)
Author(s)
F Sarubbi (TU Delft - Electronic Components, Technology and Materials)
T.L.M. Scholtes (TU Delft - Electronic Components, Technology and Materials)
LK Nanver (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
DOI related publication
https://doi.org/10.1007/s11664-009-1018-6
To reference this document use:
https://resolver.tudelft.nl/uuid:1b4126a6-d988-4fbc-9a3e-80f4844b3906
More Info
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Publication Year
2009
Language
English
Research Group
Electronic Components, Technology and Materials
Issue number
2
Volume number
39
Pages (from-to)
162-173
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