Optimization of mulitlayer reflectors for extreme ultraviolet lithography

Journal article (2004)

Authors

MF Bal ImPhys/Optics - AS
M Singh ImPhys/Optics - AS
J.J.M. Braat ImPhys/Optics - AS
Research Group
ImPhys/Optics (AS) (TU Delft)
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Published Date

2004

Language

Undefined/Unknown

Reuse Rights

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Faculty

Applied Sciences

Department

ImPhys/Imaging Physics

Research Group

ImPhys/Optics