Optimization of mulitlayer reflectors for extreme ultraviolet lithography

Wavefront correction methods for extreme-ultraviolet multilayer reflectors

Analysis search and classification for reflective ring-field projection systems

Next-Generation Extreme Ultraviolet Lithographic Projection Systems

Optimizing multilayer coatings for extreme UV projection systems

Influence of Multilayers on the optical Performance of Extreme Ultra Violet Projection Systems.

The effect of obstructions on the design of reflective ring-field projection systems.

Systematic analysis of unobscured mirror systems for microlithography.