Laser annealing for ultra-shallow junction formation in advanced CMOS

Conference paper (2002)

Authors

R. Surdeanu External organisation
YV Ponomarev External organisation
MJP Hopstaken External organisation
JGM van Berkum External organisation
F Roozeboom External organisation
R Lindsay External organisation
R Cerutti External organisation
BJ Pawlak External organisation
L.K. Nanver Electronic Components, Technology and Materials - EEMCS
I Hoflijk External organisation
PA Stolk External organisation
CJJ Dachs External organisation
MA Verheijen External organisation
M Kaiser External organisation
Research Group
Electronic Components, Technology and Materials (EEMCS) (TU Delft)
More Info
expand_more

Published Date

2002

Language

Undefined/Unknown

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials