Temperature influence on etching deep holes with SF6/O2 cryogenic plasma
Conference Paper
(2001)
Author(s)
G Cracium (External organisation)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
Pasqualina M. Sarro (TU Delft - Electronic Components, Technology and Materials)
Paddy J. French (TU Delft - Electronic Instrumentation)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:2a997e26-db1b-4dee-a1c7-44151ae87ec7
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Publication Year
2001
Research Group
QN/Kavli Nanolab Delft
Pages (from-to)
62-65
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