High aspect ratio cryogenic etching of silicon with SF6/O2 plasma
Conference Paper
(2001)
Author(s)
G Cracium (External organisation)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
P. J. French (TU Delft - Electronic Instrumentation)
Research Group
QN/Kavli Nanolab Delft
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https://resolver.tudelft.nl/uuid:2bbc4b12-2faa-44ca-be46-037bcd4fd04b
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Publication Year
2001
Research Group
QN/Kavli Nanolab Delft
Pages (from-to)
783-786
ISBN (print)
90-73461-29-4
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