Sub-100 nm silicon-nitride hard-mask for high aspect-ratio silicon fins
Conference Paper
(2007)
Author(s)
V Jovanovi¿ (External organisation)
S Milosavljevi¿ (External organisation)
L. K. Nanver (TU Delft - Electronic Components, Technology and Materials)
T Suligoj (External organisation)
P Biljanovi¿ (External organisation)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:3008c8fc-1669-4585-904a-48106312df2f
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Publication Year
2007
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
1-4
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