Silicon Nitride MOMS Oscillator for Room Temperature Quantum Optomechanics

Journal Article (2018)
Author(s)

E Serra (Trento Institute for Fundamental Physics and Application)

B Morana (TU Delft - Electronic Components, Technology and Materials)

Antonio Borrielli (Institute of Materials for Electronics and Magnetism, Nanoscience-Trento-FBK Division)

Francesco Marin (University of Florence, Istituto Nazionale di Ottica, Consiglio Nazionale delle Ricerche)

G. Pandraud (TU Delft - Photovoltaic Materials and Devices)

A. Pontin (University of Florence, Istituto Nazionale di Ottica, Consiglio Nazionale delle Ricerche)

Giovanni A. Prodi (Università di Trento)

Pasqualina Sarro (TU Delft - Electronic Components, Technology and Materials)

Michele Bonaldi (Institute of Materials for Electronics and Magnetism, Nanoscience-Trento-FBK Division)

Research Group
Electronic Components, Technology and Materials
Copyright
© 2018 E. Serra, B. Morana, Antonio Borrielli, Francesco Marin, G. Pandraud, Antonio Pontin, Giovanni Andrea Prodi, Pasqualina M Sarro, Michele Bonaldi
DOI related publication
https://doi.org/10.1109/JMEMS.2018.2876593
More Info
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Publication Year
2018
Language
English
Copyright
© 2018 E. Serra, B. Morana, Antonio Borrielli, Francesco Marin, G. Pandraud, Antonio Pontin, Giovanni Andrea Prodi, Pasqualina M Sarro, Michele Bonaldi
Research Group
Electronic Components, Technology and Materials
Issue number
6
Volume number
27
Pages (from-to)
1193-1203
Reuse Rights

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Abstract

Optomechanical SiN nano-oscillators in high-finesse Fabry-Perot cavities can be used to investigate the interaction between mechanical and optical degree of freedom for ultra-sensitive metrology and fundamental quantum mechanical studies. In this paper, we present a nano-oscillator made of a high-stress round-shaped SiN membrane with an integrated on-chip 3-D acoustic shield properly designed to reduce mechanical losses. This oscillator works in the range of 200 kHz to 5 MHz and features a mechanical quality factor of Q ≃ 107 and a Q-frequency product in excess of 6.2 × 1012 Hz at room temperature, fulfilling the minimum requirement for quantum ground-state cooling of the oscillator in an optomechanical cavity. The device is obtained by MEMS deep reactive-ion etching (DRIE) bulk micromachining with a two-side silicon processing on a silicon-on-insulator wafer. The microfabrication process is quite flexible such that additional layers could be deposited over the SiN membrane before the DRIE steps, if required for a sensing application. Therefore, such oscillator is a promising candidate for quantum sensing applications in the context of the emerging field of quantum technologies. 

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