Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.
Journal Article
(2000)
Author(s)
AJ van Dodewaard (External organisation)
WSM Ketelaars (External organisation)
RFM Roes (External organisation)
JAJ Kwinten (External organisation)
FCMJM van Delft (External organisation)
Arnold J. van Run (TU Delft - QN/Kavli Nanolab Delft)
AK van Langen-Suurling (TU Delft - QN/Kavli Nanolab Delft)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:34146e90-969b-4e44-9c59-29737af5e22f
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Publication Year
2000
Research Group
QN/Kavli Nanolab Delft
Issue number
1-4
Volume number
53
Pages (from-to)
461-464
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