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FCMJM van Delft

Conference paper (1)

Journal article (3)

4 records found

1

Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographics

Journal article (2002) - M Peuker (author) , MH Lim (author) , HI Smith (author) , R Morton (author) , Anja Suurling (author) , J Romijn (author) , E.W.J.M. van der Drift (author) , FCMJM van Delft (author)

HSQ/novolak bilayer resist for high aspect ratio nanoscale e-beam lithography.

Journal article (2000) - FCMJM van Delft (author) , JP Weterings (author) , AK van Langen-Suurling (author) , J Romijn (author)

Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

Journal article (2000) - AJ van Dodewaard (author) , WSM Ketelaars (author) , RFM Roes (author) , JAJ Kwinten (author) , FCMJM van Delft (author) , A.J. van Run (author) , A. K. Suurling (author)

Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.

Conference paper (1999) - AJ van Dodewaard (author) , WSM Ketelaars (author) , RFM Roes (author) , JAJ Kwinten (author) , FCMJM van Delft (author) , Arnold J. van Run (author) , J Romijn (author) , A.K. Suurling (author)