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Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.
Conference paper -
AJ van Dodewaard
,
WSM Ketelaars
,
RFM Roes
,
JAJ Kwinten
,
FCMJM van Delft
,
A.J. van Run
,
J Romijn
,
A.K. van Langen-Suurling
Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.
Journal article -
AJ van Dodewaard
,
WSM Ketelaars
,
RFM Roes
,
JAJ Kwinten
,
FCMJM van Delft
,
A.J. van Run
,
A.K. van Langen-Suurling