Comparison of negative tone resists NEB22 and UVN30 in e-beam lithography.
Conference Paper
(1999)
Author(s)
AJ van Dodewaard (External organisation)
WSM Ketelaars (External organisation)
RFM Roes (External organisation)
JAJ Kwinten (External organisation)
FCMJM van Delft (External organisation)
Arnold J. van Run (TU Delft - QN/Kavli Nanolab Delft)
J Romijn (TU Delft - QN/Kavli Nanolab Delft)
AK Suurling (TU Delft - QN/Kavli Nanolab Delft)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:85ad936a-859e-4aa3-96c0-494d17420f39
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Publication Year
1999
Research Group
QN/Kavli Nanolab Delft
Pages (from-to)
461-464
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