Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographics
Journal Article
(2002)
Author(s)
M Peuker (External organisation)
MH Lim (External organisation)
HI Smith (External organisation)
R Morton (External organisation)
A. K. Suurling (TU Delft - QN/Kavli Nanolab Delft)
J Romijn (TU Delft - QN/Kavli Nanolab Delft)
E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)
FCMJM van Delft (External organisation)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:9ab0f359-3845-4f3a-a44c-737a34c2970b
More Info
expand_more
expand_more
Publication Year
2002
Research Group
QN/Kavli Nanolab Delft
Volume number
61-62
Pages (from-to)
803-809
No files available
Metadata only record. There are no files for this record.