Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographics

Journal Article (2002)
Authors

M Peuker (External organisation)

MH Lim (External organisation)

HI Smith (External organisation)

R Morton (External organisation)

Anja Van Langen-Suurling (TU Delft - QN/Kavli Nanolab Delft)

J Romijn (TU Delft - QN/Kavli Nanolab Delft)

E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)

FCMJM van Delft (External organisation)

Research Group
QN/Kavli Nanolab Delft
More Info
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Publication Year
2002
Research Group
QN/Kavli Nanolab Delft
Volume number
61-62
Pages (from-to)
803-809

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