Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographics
Journal Article
(2002)
Authors
M Peuker (External organisation)
MH Lim (External organisation)
HI Smith (External organisation)
R Morton (External organisation)
Anja Van Langen-Suurling (TU Delft - QN/Kavli Nanolab Delft)
J Romijn (TU Delft - QN/Kavli Nanolab Delft)
E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)
FCMJM van Delft (External organisation)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/9ab0f359-3845-4f3a-a44c-737a34c2970b
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Publication Year
2002
Research Group
QN/Kavli Nanolab Delft
Volume number
61-62
Pages (from-to)
803-809
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