HSQ/novolak bilayer resist for high aspect ratio nanoscale e-beam lithography.
Journal Article
(2000)
Author(s)
FCMJM van Delft (External organisation)
JP Weterings (External organisation)
Anja van Langen-Suurling (TU Delft - QN/Kavli Nanolab Delft)
J Romijn (TU Delft - QN/Kavli Nanolab Delft)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:77a09d39-66d1-4f02-aaa2-7175693147d6
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Publication Year
2000
Research Group
QN/Kavli Nanolab Delft
Issue number
6
Volume number
18
Pages (from-to)
3419-3423
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