Room-temperature several-hundred-of-megahertz charge sensing with single-electron resolution using a silicon transistor
Katsuhiko Nishiguchi (NTT Corporation)
Hiroshi Yamaguchi (NTT Corporation)
Akira Fujiwara (NTT Corporation)
H.S.J. van der Zant (TU Delft - QN/van der Zant Lab, Kavli institute of nanoscience Delft)
G.A. Steele (TU Delft - QN/Steele Lab, Kavli institute of nanoscience Delft)
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Abstract
We demonstrate charge detection with single-electron resolution at high readout frequency using a silicon field-effect transistor (FET) integrated with double resonant circuits. A FET, whose channel of 10-nm width enables a single electron to be detected at room temperature, is connected to resonant circuits composed of coupled inductors and capacitors, and these double resonant circuits provide two resonance frequencies. When the FET is driven by a carrier signal at the lower resonance frequency, a small signal applied to the FET's gate modulates the resonance condition, resulting in a reflected signal appearing near the higher resonance frequency. Such operation utilizing the double resonant circuits enables charge detection with a single-electron resolution of 3 × 10-3 e/Hz0.5 and a readout frequency of 200 MHz at room temperature. In addition, a variable capacitor used in the double resonant circuits allows charge-sensing characteristics to be controlled in situ.