Aspect ratio and crystallographic orientation dependence in deep dry silicon etching at cryogenic temperatures.
Conference Paper
(2001)
Author(s)
G Craciun (TU Delft - Electronic Instrumentation)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)
PJ French (TU Delft - Electronic Instrumentation)
Research Group
Electronic Instrumentation
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Publication Year
2001
Research Group
Electronic Instrumentation
Pages (from-to)
612-615
ISBN (print)
3-540-42150-5
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