Parameter calibration for dopant post-implant diffusion

Conference paper (2001)

Authors

J Fu Electronic Components, Technology and Materials - EEMCS
WJ Eysenga Electronic Components, Technology and Materials - EEMCS
W Crans Electronic Components, Technology and Materials - EEMCS
Research Group
Electronic Components, Technology and Materials (EEMCS) (TU Delft)
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Published Date

2001

Language

Undefined/Unknown

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials