Parameter calibration for dopant post-implant diffusion
Conference Paper
(2001)
Author(s)
J Fu (TU Delft - Electronic Components, Technology and Materials)
WJ Eysenga (TU Delft - Electronic Components, Technology and Materials)
W Crans (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
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https://resolver.tudelft.nl/uuid:45057bb7-5a5e-40a3-8268-e0e8618f360a
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Publication Year
2001
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
52-57
ISBN (print)
90-73461-29-4
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