16 records found
1
Parameter calibration on post-implantation dopant diffusion
Weer woord op het protocol van proposal DET 5788
Parameter calibration for dopant post-implant diffusion
Varying characteristics of bipolar transistors with emitter contact window width
Optimization of an integrated high power vertical PNP transistor
A robust implementation of stress governing equations for next generation process simulators
Improving the speed performance of large scale TCAD simulators for microelectronics by multygrid and parallelisation - DEL 5672
The influence of mechanical stresses on the characteristics of bipolar transistors
De DIMES cleanroom en zijn virtuele tegenhanger: een garantie voor baanbrekend, gevarieerd en diepgaand onderzoek aan geintegreerde circuits
Improving the performance of process stimulators by multigrid (MG) methods and parallelisation. Half yearly report, working period: Jan. - June 2000 [confidential]
Improving the performance of process simulators by multigrid (MG) methods and parallelisation
Improving the performance of process simulators by multigrid (MG) methods and parallelisation. Annual report: September-December 1998 [vertrouwelijk]
Improving the performance of process simulators by multigrid (MG) methods and parallelisation. Half-yearly report: January-June 1999 [vertrouwelijk]
Comparison of numerical simulations and experimental results on ridge wave guide lasers
