16 records found
1
Parameter calibration on post-implantation dopant diffusion
Weer woord op het protocol van proposal DET 5788
Parameter calibration for dopant post-implant diffusion
Varying characteristics of bipolar transistors with emitter contact window width
Improving the speed performance of large scale TCAD simulators for microelectronics by multygrid and parallelisation - DEL 5672
A robust implementation of stress governing equations for next generation process simulators
Optimization of an integrated high power vertical PNP transistor
De DIMES cleanroom en zijn virtuele tegenhanger: een garantie voor baanbrekend, gevarieerd en diepgaand onderzoek aan geintegreerde circuits
The influence of mechanical stresses on the characteristics of bipolar transistors
Improving the performance of process simulators by multigrid (MG) methods and parallelisation
Improving the performance of process stimulators by multigrid (MG) methods and parallelisation. Half yearly report, working period: Jan. - June 2000 [confidential]
Comparison of numerical simulations and experimental results on ridge wave guide lasers
Improving the performance of process simulators by multigrid (MG) methods and parallelisation. Half-yearly report: January-June 1999 [vertrouwelijk]
Improving the performance of process simulators by multigrid (MG) methods and parallelisation. Annual report: September-December 1998 [vertrouwelijk]
