Single step cryogenic SF6/O2 plasma etching process for the development of a novel quad gyroscope
Conference Paper
(2002)
Author(s)
G Craciun (TU Delft - Electronic Instrumentation)
H Yang (TU Delft - Electronic Instrumentation)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Patrick J. French (TU Delft - Electronic Instrumentation)
Research Group
Electronic Instrumentation
To reference this document use:
https://resolver.tudelft.nl/uuid:465724de-cb64-491e-b08f-0970e1edf4ab
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Publication Year
2002
Research Group
Electronic Instrumentation
Pages (from-to)
55-58
ISBN (print)
973-0-02472-3
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