Combined BEM/FEM resistance modeling of straified substrates with layout-dependent doping patterns in the top layer
Conference Paper
(2001)
Author(s)
E. Schrik (TU Delft - Signal Processing Systems)
AJ van Genderen (TU Delft - Microelectronics)
N.P. van der Meijs (TU Delft - Signal Processing Systems)
Research Group
Signal Processing Systems
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https://resolver.tudelft.nl/uuid:49d0836c-ad9a-4958-bd3f-2b211a917219
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Publication Year
2001
Research Group
Signal Processing Systems
Pages (from-to)
598-604
ISBN (print)
90-73461-29-4
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