Combined BEM/FEM resistance modeling of straified substrates with layout-dependent doping patterns in the top layer

Conference paper (2001)

Authors

E. Schrik Signal Processing Systems - EEMCS
A.J. van Genderen Microelectronics
N.P. van der Meijs Signal Processing Systems - EEMCS
Research Group
Signal Processing Systems (EEMCS) (TU Delft)
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Published Date

2001

Language

Undefined/Unknown

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Signal Processing Systems