TEM study of locally coated nanopore fabricated by ion-beam-induced deposition in a thin membrane

Journal article (2010)

Authors

M. Wu

P Chen QN/Kavli Nanolab Delft -

U. Ziese

P.F.A. Alkemade QN/Kavli Nanolab Delft -

H.W.M. Salemink QN/Photronic Devices

H.W. Zandbergen

More Info

expand_more

To reference this document use:

http://resolver.tudelft.nl/uuid:4dcdb3b1-ad4a-43d5-aba9-e5fb37fd75d3

Published Date

2010

Language

English

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Abstract

We studied the formation of locally coated sub-10-nm nanopores fabricated by ion-beam milling and ion-beam-induced deposition (IBID) in a thin silicon nitride membrane. Two typical precursor gases representing conductive ((CH3)(3)Pt(CpCH3). CPC for short) and insulating (tetra ethyl oxysilane, TEOS for short) material deposition are used. Three-dimensional electron tomography, EDX and EELS analysis are used to measure the changes in chemical composition and shape of the pores after their formation and at various stages of pore shrinkage. The formation and shrinkage are shown to be due to a shifting competition between IBID and material sputtering during ion-beam exposure. The chemical distribution at the rim of the nanopore is dependent on the precursor gases used: CPC forms a thin carbon layer with small embedded Pt particles at the top and inner surfaces of the nanopore, whereas TEOS forms SiOxCy with Ga particles dispersed at the rim of the nanopore.