Monolithic photonic integration technology platform and devices at wavelengths beyond 2 μm for gas spectroscopy applications

Conference paper (2017)

Authors

S Latkowski Eindhoven University of Technology
P. J. Van Veldhoven Eindhoven University of Technology
KA Williams Eindhoven University of Technology
E.A.J.M. Bente Eindhoven University of Technology
A. Hänsel ImPhys/Optics - AS
D. D'Agostino Eindhoven University of Technology
H. Rabbani-Haghighi Eindhoven University of Technology
B. Docter EFFECT Photonics B.V.
N. Bhattacharya ImPhys/Optics - AS
P. J A Thijs Eindhoven University of Technology
H. P M M Ambrosius Eindhoven University of Technology
M Smit Eindhoven University of Technology
Research Group
ImPhys/Optics (AS) (TU Delft)
Copyright: © 2017 S Latkowski, P. J. Van Veldhoven, A. Hänsel, D. D'Agostino, H. Rabbani-Haghighi, B. Docter, N. Bhattacharya, P. J A Thijs, H. P M M Ambrosius, M Smit, KA Williams, E.A.J.M. Bente
DOI: https://doi.org/10.1117/12.2256604
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Published Date

2017

Language

English

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Faculty

Applied Sciences

Department

ImPhys/Imaging Physics

Research Group

ImPhys/Optics

Abstract

In this paper a generic monolithic photonic integration technology platform and tunable laser devices for gas sensing applications at 2 μm will be presented. The basic set of long wavelength optical functions which is fundamental for a generic photonic integration approach is realized using planar, but-joint, active-passive integration on indium phosphide substrate with active components based on strained InGaAs quantum wells. Using this limited set of basic building blocks a novel geometry, widely tunable laser source was designed and fabricated within the first long wavelength multiproject wafer run. The fabricated laser operates around 2027 nm, covers a record tuning range of 31 nm and is successfully employed in absorption measurements of carbon dioxide. These results demonstrate a fully functional long wavelength photonic integrated circuit that operates at these wavelengths. Moreover, the process steps and material system used for the long wavelength technology are almost identical to the ones which are used in the technology process at 1.5μm which makes it straightforward and hassle-free to transfer to the photonic foundries with existing fabrication lines. The changes from the 1550 nm technology and the trade-offs made in the building block design and layer stack will be discussed.

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