Cl-2/O-2- and Cl-2/N-2-based inductively coupled plasma etching of photonic crystals in InP: Sidewall passivation

Conference Paper (2005)
Author(s)

R van der Heijden (External organisation)

CF Carlstrom (External organisation)

E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)

RW van der Heijden (External organisation)

R Notzel (External organisation)

R Veldhoven (External organisation)

F Karouta (External organisation)

H.W.M. Salemink (TU Delft - QN/Afdelingsbureau)

A Talneau (External organisation)

Research Group
QN/Kavli Nanolab Delft
More Info
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Publication Year
2005
Research Group
QN/Kavli Nanolab Delft
Pages (from-to)
315-318

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