Cl-2/O-2- and Cl-2/N-2-based inductively coupled plasma etching of photonic crystals in InP: Sidewall passivation
Conference Paper
(2005)
Author(s)
R van der Heijden (External organisation)
CF Carlstrom (External organisation)
E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)
RW van der Heijden (External organisation)
R Notzel (External organisation)
R Veldhoven (External organisation)
F Karouta (External organisation)
H.W.M. Salemink (TU Delft - QN/Afdelingsbureau)
A Talneau (External organisation)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:55d2d700-6e8c-4551-b704-9bc4cd54f613
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Publication Year
2005
Research Group
QN/Kavli Nanolab Delft
Pages (from-to)
315-318
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