Infinite-layer copper-oxide laser-ablated thin films
Substrate, buffer-layer, and processing effects
J. T. Markert (The University of Texas at Austin)
T. C. Messina (The University of Texas at Austin)
Bernard Dam (Vrije Universiteit Amsterdam)
J. M. Huijbregste (Vrije Universiteit Amsterdam)
J. Rector (Vrije Universiteit Amsterdam)
Ronald Griessen (Vrije Universiteit Amsterdam)
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Abstract
Laser-ablation studies of highly-oriented thin films of the electon-doped infinite-layer copper-oxide compounds Sr/sub 1-x/La/sub x/CuO/sub 2/ are reported. We observe significant variations in film properties with substrate or buffer layer material. X-ray diffraction, atomic force microscopy (AFM), Rutherford back-scattering (RBS), and electrical resistivity were used to characterize the films. Films were deposited on strontium titanate [001] or on buffer layers of T'-phase copper oxides (Ln/sub 2/CuO/sub 4/ with Ln = Pr, Nd, Sm), Sr/sub 3/FeNb/sub 2/O/sub 9/, and La/sub 1.8/Y/sub 0.2/CuO/sub 4/ on SrTiO/sub 3/ [001]. The in-plane lattice constants of such buffer layers (a = 0.390 - 0.400 nm) should provide the bond tension required for electron doping. Extremely flat, epitaxial buffer layers with X-ray rocking curves as narrow as 0.08/spl deg/ were obtained from stoichiometric targets of Ln/sub 2/CuO/sub 4/; the other buffer layers yielded poor epitaxy. A linear dependence of infinite-layer c-axis plane spacing on substrate or buffer-layer in-plane a-axis lattice constant is observed.
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