Application of spacer hard-masks for sub-100 nm wide silicon fin-etching
Conference Paper
(2006)
Author(s)
V. Jovanovic (TU Delft - Old - EWI Ch. Integrated Sensing Devices)
S. Milosavljević (TU Delft - Electronic Components, Technology and Materials)
L. K. Nanver (TU Delft - Electronic Components, Technology and Materials)
T Suligoj (External organisation)
Research Group
Old - EWI Ch. Integrated Sensing Devices
To reference this document use:
https://resolver.tudelft.nl/uuid:60a67d6e-a950-4234-b097-dc1d9db49090
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Publication Year
2006
Research Group
Old - EWI Ch. Integrated Sensing Devices
Pages (from-to)
519-522
ISBN (print)
90-73461-44-8
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