Application of spacer hard-masks for sub-100 nm wide silicon fin-etching

Conference paper (2006)

Authors

V. Jovanovic Old - EWI Ch. Integrated Sensing Devices
S. Milosavljevic Electronic Components, Technology and Materials - EEMCS
L.K. Nanver Electronic Components, Technology and Materials - EEMCS
T Suligoj External organisation
Research Group
Old - EWI Ch. Integrated Sensing Devices
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Published Date

2006

Language

Undefined/Unknown

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Research Group

Old - EWI Ch. Integrated Sensing Devices