Significant role of phase mask structures in extreme ultraviolet lithopgraphy to achieve near-wavelength resolution. IN PRESS
Journal Article
(2009)
Author(s)
A.M. Nugrowati (TU Delft - ImPhys/Optics)
SF Pereira (TU Delft - ImPhys/Optics)
Joseph Braat (TU Delft - ImPhys/Optics)
Research Group
ImPhys/Optics
To reference this document use:
https://resolver.tudelft.nl/uuid:712a66c2-ac6b-4374-984d-514992400a58
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Publication Year
2009
Research Group
ImPhys/Optics
Issue number
00
Volume number
00
Pages (from-to)
00-00
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