Significant role of phase mask structures in extreme ultraviolet lithopgraphy to achieve near-wavelength resolution. IN PRESS

Journal article (2009)

Authors

A.M. Nugrowati ImPhys/Optics - AS
S.F. Pereira ImPhys/Optics - AS
J.J.M. Braat ImPhys/Optics - AS
Research Group
ImPhys/Optics (AS) (TU Delft)
More Info
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Published Date

2009

Language

Undefined/Unknown

Reuse Rights

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Faculty

Applied Sciences

Department

ImPhys/Imaging Physics

Research Group

ImPhys/Optics