Significant role of phase mask structures in extreme ultraviolet lithopgraphy to achieve near-wavelength resolution. IN PRESS

Studying light Diffraction at A Small Scale: applications and theories.

Near field intermediate fields of an ultrashort pulse transmitted through Young's double-slit experiment.

Combining various optical simulations tools to enable complex optical systems simulations.

Studying light Diffraction at A Small Scale: applications and theories.

Vectorial Diffrection of Extreme Ultraviolet Light and Ultrashort Light Pulses.

Polarisation-sensitive ultrashort pulse shaping by narrow metal slits

Studying light Diffraction at A Small Scale: applications and theories.

Erratum: Interference or not: Analysis of the young's experiment for a single-cycle pulse

Numerical analysis of aslit-groove diffrection problem

Rigorous calculation of the time evolution of an ultrashort pulse through slit structures in the near and intermediate zones.

Resolution enhancement in extreme ultraviolet lithography: the imaging of a 2-D reflecting phase shifting mask with conical illumination.

EUV phase mask engineering based on image optimisation.

Enhanced imaging in Extreme UV lithography by optimising the Molybdenum/Silicon thickness ratio in 2-D phase shifting mask design.