Significant role of phase mask structures in extreme ultraviolet lithopgraphy to achieve near-wavelength resolution. IN PRESS

Studying light Diffraction at A Small Scale: applications and theories.

Erratum: Interference or not: Analysis of the young's experiment for a single-cycle pulse

Vectorial Diffrection of Extreme Ultraviolet Light and Ultrashort Light Pulses.

Polarisation-sensitive ultrashort pulse shaping by narrow metal slits

Studying light Diffraction at A Small Scale: applications and theories.

Near field intermediate fields of an ultrashort pulse transmitted through Young's double-slit experiment.

Combining various optical simulations tools to enable complex optical systems simulations.

Studying light Diffraction at A Small Scale: applications and theories.

Numerical analysis of aslit-groove diffrection problem

Resolution enhancement in extreme ultraviolet lithography: the imaging of a 2-D reflecting phase shifting mask with conical illumination.

Rigorous calculation of the time evolution of an ultrashort pulse through slit structures in the near and intermediate zones.

EUV phase mask engineering based on image optimisation.

Enhanced imaging in Extreme UV lithography by optimising the Molybdenum/Silicon thickness ratio in 2-D phase shifting mask design.