Enhanced imaging in Extreme UV lithography by optimising the Molybdenum/Silicon thickness ratio in 2-D phase shifting mask design.

Poster (2005)

Authors

A.M. Nugrowati ImPhys/Optics - AS
A.S. van de Nes ImPhys/Optics - AS
S.F. Pereira ImPhys/Optics - AS
J.J.M. Braat ImPhys/Optics - AS
Research Group
ImPhys/Optics (AS) (TU Delft)
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Published Date

2005

Language

Undefined/Unknown

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Faculty

Applied Sciences

Department

ImPhys/Imaging Physics

Research Group

ImPhys/Optics