Enhanced imaging in Extreme UV lithography by optimising the Molybdenum/Silicon thickness ratio in 2-D phase shifting mask design.
Poster
(2005)
Author(s)
A.M. Nugrowati (TU Delft - ImPhys/Optics)
A.S. van de Nes (TU Delft - ImPhys/Optics)
S.F. Pereira (TU Delft - ImPhys/Optics)
J.J.M. Braat (TU Delft - ImPhys/Optics)
Research Group
ImPhys/Optics
To reference this document use:
https://resolver.tudelft.nl/uuid:862ff131-e02f-496e-8782-cd3477d76bc0
More Info
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Publication Year
2005
Research Group
ImPhys/Optics
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