Resolution enhancement in extreme ultraviolet lithography: the imaging of a 2-D reflecting phase shifting mask with conical illumination.
Conference Paper
(2006)
Author(s)
A.M. Nugrowati (TU Delft - ImPhys/Optics)
A.S. van de Nes (TU Delft - ImPhys/Optics)
S.F. Pereira (TU Delft - ImPhys/Optics)
J.J.M. Braat (TU Delft - ImPhys/Optics)
Research Group
ImPhys/Optics
To reference this document use:
https://resolver.tudelft.nl/uuid:f3eaa2c1-1f64-4f3a-a2fe-e498debbcfa9
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Publication Year
2006
Research Group
ImPhys/Optics
Pages (from-to)
110-111
ISBN (print)
3-00-019532-7
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