Significant role of phase mask structures in extreme ultraviolet lithopgraphy to achieve near-wavelength resolution. IN PRESS

Vectorial Diffrection of Extreme Ultraviolet Light and Ultrashort Light Pulses.

Near field intermediate fields of an ultrashort pulse transmitted through Young's double-slit experiment.

Combining various optical simulations tools to enable complex optical systems simulations.

Studying light Diffraction at A Small Scale: applications and theories.

Erratum: Interference or not: Analysis of the young's experiment for a single-cycle pulse

Studying light Diffraction at A Small Scale: applications and theories.

Studying light Diffraction at A Small Scale: applications and theories.

Polarisation-sensitive ultrashort pulse shaping by narrow metal slits

Numerical analysis of aslit-groove diffrection problem

EUV phase mask engineering based on image optimisation.

Rigorous calculation of the time evolution of an ultrashort pulse through slit structures in the near and intermediate zones.

Resolution enhancement in extreme ultraviolet lithography: the imaging of a 2-D reflecting phase shifting mask with conical illumination.

Enhanced imaging in Extreme UV lithography by optimising the Molybdenum/Silicon thickness ratio in 2-D phase shifting mask design.