Lutetium coating of nanoparticles by atomic layer deposition

Journal article (2020)

Authors

J.L.T.M. Moret RID/KEWO/Stralingsbeschermingseenheid , ChemE/Product and Process Engineering - AS
Matthew B.E. Griffiths Carleton University
B.E. Terpstra RST/Technici Pool - AS
H.T. Wolterbeek RST/Applied Radiation & Isotopes - AS
Seán T. Barry Carleton University
A.G. Denkova RST/Applied Radiation & Isotopes - AS
J.R. van Ommen ChemE/Product and Process Engineering - AS
Research Group
RID/KEWO/Stralingsbeschermingseenheid
Copyright: © 2020 J.L.T.M. Moret, Matthew B.E. Griffiths, Jeannine E.B.M. Frijns, B.E. Terpstra, H.T. Wolterbeek, Seán T. Barry, A.G. Denkova, J.R. van Ommen
DOI
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https://doi.org/10.1116/1.5134446
More Info
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Published Date

2020

Language

English

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Research Group

RID/KEWO/Stralingsbeschermingseenheid

Abstract

Atomic layer deposition (ALD) is a versatile gas phase coating technique that allows coating of complex structured materials, as well as high-surface area materials such as nanoparticles. In this work, ALD is used to deposit a lutetium oxide layer on TiO2 nanoparticles (P25) in a fluidized bed reactor to produce particles for nuclear medical applications. Two precursors were tested: the commercially available Lu(TMHD)3 and the custom-made Lu(HMDS)3. Using Lu(TMHD)3, a lutetium loading up to 15 wt. % could be obtained, while using Lu(HMDS)3, only 0.16 wt. % Lu could be deposited due to decomposition of the precursor. Furthermore, it was observed that vibration-assisted fluidization allows for better fluidization of the nanoparticles and hence a higher degree of coating.