Lutetium coating of nanoparticles by atomic layer deposition
J.L.T.M. Moret (TU Delft - ChemE/Product and Process Engineering, TU Delft - RID/KEWO/Stralingsbeschermingseenheid)
Matthew B.E. Griffiths (Carleton University)
Jeannine E.B.M. Frijns (Student TU Delft)
BE Terpstra (TU Delft - RST/Technici Pool)
H. T. Wolterbeek (TU Delft - RST/Applied Radiation & Isotopes)
Seán T. Barry (Carleton University)
A. G. Denkova (TU Delft - RST/Applied Radiation & Isotopes)
Ruud Van Ommen (TU Delft - ChemE/Product and Process Engineering)
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Abstract
Atomic layer deposition (ALD) is a versatile gas phase coating technique that allows coating of complex structured materials, as well as high-surface area materials such as nanoparticles. In this work, ALD is used to deposit a lutetium oxide layer on TiO2 nanoparticles (P25) in a fluidized bed reactor to produce particles for nuclear medical applications. Two precursors were tested: the commercially available Lu(TMHD)3 and the custom-made Lu(HMDS)3. Using Lu(TMHD)3, a lutetium loading up to 15 wt. % could be obtained, while using Lu(HMDS)3, only 0.16 wt. % Lu could be deposited due to decomposition of the precursor. Furthermore, it was observed that vibration-assisted fluidization allows for better fluidization of the nanoparticles and hence a higher degree of coating.