Temperature influence on etching deep holes with SF6/O2 cryogenic plasma
Journal Article
(2002)
Author(s)
G Craciun (TU Delft - Electronic Instrumentation)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Lina Sarro (TU Delft - Electronic Components, Technology and Materials)
P. J. French (TU Delft - Electronic Instrumentation)
Research Group
Electronic Instrumentation
To reference this document use:
https://resolver.tudelft.nl/uuid:7da9a81c-bd58-47fb-98ee-a8102385ca7d
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Publication Year
2002
Research Group
Electronic Instrumentation
Volume number
12
Pages (from-to)
390-394
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