Temperature influence on etching deep holes with SF6/O2 cryogenic plasma

Journal Article (2002)
Author(s)

G Craciun (TU Delft - Electronic Instrumentation)

MA Blauw (TU Delft - QN/Kavli Nanolab Delft)

EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)

Lina Sarro (TU Delft - Electronic Components, Technology and Materials)

P. J. French (TU Delft - Electronic Instrumentation)

Research Group
Electronic Instrumentation
More Info
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Publication Year
2002
Research Group
Electronic Instrumentation
Volume number
12
Pages (from-to)
390-394

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