Temperature influence on etching deep holes with SF6/O2 cryogenic plasma

Journal article (2002)

Authors

G Craciun Electronic Instrumentation - EEMCS
MA Blauw QN/Kavli Nanolab Delft - AS
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
Pasqualina M Sarro Electronic Components, Technology and Materials - EEMCS
P.J. French Electronic Instrumentation - EEMCS
Research Group
Electronic Instrumentation (EEMCS) (TU Delft)
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Published Date

2002

Language

Undefined/Unknown

Reuse Rights

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Instrumentation