Temperature influence on etching deep holes with SF6/O2 cryogenic plasma

Journal Article (2002)
Authors

G Craciun (TU Delft - Electronic Instrumentation)

MA Blauw (TU Delft - QN/Kavli Nanolab Delft)

E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)

Lina Sarro (TU Delft - Electronic Components, Technology and Materials)

Paddy French (TU Delft - Electronic Instrumentation)

Research Group
Electronic Instrumentation
More Info
expand_more
Publication Year
2002
Research Group
Electronic Instrumentation
Volume number
12
Pages (from-to)
390-394

No files available

Metadata only record. There are no files for this record.